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On the chemistry mechanism for low-pressure chlorine process plasmas.
- Source :
- Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Sep2022, Vol. 40 Issue 5, p1-11, 11p
- Publication Year :
- 2022
-
Abstract
- A chemical reaction mechanism of chlorine plasma under low-pressure conditions that is widely used in the literature is validated against the experimental data of Y. Wang and J. K. Olthoff [J. Appl. Phys. 85, 6358 (1999)] for an inductively coupled plasma reactor. The model used in the present study is a self-consistent two-dimensional fluid plasma model coupled with Maxwell's equations. The quantities of interest in the plasma are the fluxes and energy distribution functions of Cl<subscript>2</subscript><superscript>+</superscript> and Cl<superscript>+</superscript> ions. We find that the charge exchange reaction between Cl<superscript>+</superscript> and Cl<subscript>2</subscript> that is typically included in chlorine plasma reaction mechanisms results in poor predictability of the model compared to experiments. Neglecting this reaction allows for a correct prediction of the dominant ion species in the low-pressure chlorine plasma and dependence of their fluxes on the gas pressure. Additionally, neglecting the charge exchange reaction allows for a rather accurate prediction of ion energy distribution functions at the grounded electrode. Overall, we conclude that the rate coefficient of the charge exchange reaction between Cl<superscript>+</superscript> and Cl<subscript>2</subscript> reported in the literature significantly exceeds what may in fact explain the role of this process in a low-pressure plasma discharge. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 21662746
- Volume :
- 40
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
- Publication Type :
- Academic Journal
- Accession number :
- 159299390
- Full Text :
- https://doi.org/10.1116/6.0002055