Back to Search Start Over

On the chemistry mechanism for low-pressure chlorine process plasmas.

Authors :
Levko, Dmitry
Raja, Laxminarayan L.
Source :
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Sep2022, Vol. 40 Issue 5, p1-11, 11p
Publication Year :
2022

Abstract

A chemical reaction mechanism of chlorine plasma under low-pressure conditions that is widely used in the literature is validated against the experimental data of Y. Wang and J. K. Olthoff [J. Appl. Phys. 85, 6358 (1999)] for an inductively coupled plasma reactor. The model used in the present study is a self-consistent two-dimensional fluid plasma model coupled with Maxwell's equations. The quantities of interest in the plasma are the fluxes and energy distribution functions of Cl<subscript>2</subscript><superscript>+</superscript> and Cl<superscript>+</superscript> ions. We find that the charge exchange reaction between Cl<superscript>+</superscript> and Cl<subscript>2</subscript> that is typically included in chlorine plasma reaction mechanisms results in poor predictability of the model compared to experiments. Neglecting this reaction allows for a correct prediction of the dominant ion species in the low-pressure chlorine plasma and dependence of their fluxes on the gas pressure. Additionally, neglecting the charge exchange reaction allows for a rather accurate prediction of ion energy distribution functions at the grounded electrode. Overall, we conclude that the rate coefficient of the charge exchange reaction between Cl<superscript>+</superscript> and Cl<subscript>2</subscript> reported in the literature significantly exceeds what may in fact explain the role of this process in a low-pressure plasma discharge. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21662746
Volume :
40
Issue :
5
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
Publication Type :
Academic Journal
Accession number :
159299390
Full Text :
https://doi.org/10.1116/6.0002055