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General aspects of the physical behavior of polycrystalline BiFeO3/VO2 bilayers grown on sapphire substrates.

Authors :
Martinez, J.
Dionizio, S.
Gutierrez, N.
Mosquera, E.
Diosa, J. E.
Bolaños, G.
Moran, O.
Source :
Applied Physics A: Materials Science & Processing; Aug2022, Vol. 128 Issue 8, p1-10, 10p
Publication Year :
2022

Abstract

Heterostructures composed of bismuth ferrite, BiFeO<subscript>3</subscript>, and vanadium dioxide, VO<subscript>2</subscript>, films were successfully grown by means of the radio-frequency and DC sputtering on sapphire substrates. The X-ray diffraction (XRD) patterns showed that both films were polycrystalline in nature. The XRD data revealed the formation of the monoclinic VO<subscript>2</subscript>(M) phase. The bottom VO<subscript>2</subscript> exhibited a sharp metal–insulator transition (MIT) at ~ 327 K with a variation in the value of the resistance of two orders of magnitude. Measurements of the electric polarization (P) versus the electric field (E) of the top BiFeO<subscript>3</subscript> showed closed loops, although visually distinct from those of a true ferroelectric. In spite of the well-defined MIT of VO<subscript>2</subscript>, the effect of the structural change associated with the transition on the ferroelectric properties of BiFeO<subscript>3</subscript> was masked by the large leakage currents. The probably perturbation of the ferroelectric order in the BiFeO<subscript>3</subscript>, associated with the structural changes through the MIT of VO<subscript>2</subscript> was investigated by measuring the P-E dependence at temperatures below and above the MIT of VO<subscript>2</subscript>. Although round-shaped hysteresis were obtained, a small but sizeable difference in the values of the apparent remnant P at the temperatures of interest was observed. By the same token, the transition of VO<subscript>2</subscript> seemed to influence the possible magneto-electric coupling in the BiFeO<subscript>3</subscript> layer. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09478396
Volume :
128
Issue :
8
Database :
Complementary Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Academic Journal
Accession number :
158326081
Full Text :
https://doi.org/10.1007/s00339-022-05798-1