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9‐1: Evaluation of X‐ray Resistance of Submicron‐Size c‐Axis Aligned Crystalline‐Oxide Semiconductor.

Authors :
Tsuda, Kazuki
Takahashi, Hironobu
Hamada, Toshiki
Saito, Satoru
Baba, Haruyuki
Takahashi, Masahiro
Obonai, Toshimitsu
Koezuka, Junichi
Kunitake, Hitoshi
Kobayashi, Daisuke
Tajima, Michio
Yamazaki, Shunpei
Source :
SID Symposium Digest of Technical Papers; Jun2022, Vol. 53 Issue 1, p78-81, 4p
Publication Year :
2022

Abstract

We have investigated the total ionizing dose effect by X‐rays, which is a degradation mode of a single transistor, to find the radiation resistance of oxide semiconductor large scale integrated circuit. At 3000 Gy corresponding to the absorbed dose for 30 years in a space environment, or more specifically, on a geostationary orbit, an oxide semiconductor field‐effect transistor showed a negative drift in threshold voltage of less than 300m V and substantially no degradation in subthreshold slope and mobility. After 60 hours from the irradiation, approximately 40% of the threshold voltage variation was recovered. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0097966X
Volume :
53
Issue :
1
Database :
Complementary Index
Journal :
SID Symposium Digest of Technical Papers
Publication Type :
Academic Journal
Accession number :
157690798
Full Text :
https://doi.org/10.1002/sdtp.15421