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Alloy-buffer-controlled van der Waals epitaxial growth of aligned tellurene.

Authors :
Wang, Cong
Xu, Chao
Guo, Xuyun
Zhang, Ning
Yan, Jianmin
Chen, Jiewei
Yu, Wei
Qin, Jing-Kai
Zhu, Ye
Li, Lain-Jong
Chai, Yang
Source :
Nano Research; Jun2022, Vol. 15 Issue 6, p5712-5718, 7p
Publication Year :
2022

Abstract

Group-VI elemental two-dimensional (2D) materials (e.g., tellurene (Te)) have unique crystalline structures and extraordinarily physical properties. However, it still remains a great challenge to controllably grow 2D Te with good repeatability, uniformity, and highly aligned orientation using vapor growth method. Here, we design a Cu foil-assisted alloy-buffer-controlled growth method to epitaxially grow aligned single-crystalline 2D Te on an insulating mica substrate. The in-situ formation of Cu−Te alloy plays a key role on 2D Te growth, alleviating the spatial and temporal non-uniformity of precursor in conventional vapor deposition process. Through transmission electron microscopy (TEM) analysis combined with theoretical calculations, we unveil that the alignment growth of Te in the [110] direction is along the [600] direction of mica, owing to the small lattice mismatch (0.15%) and strong binding strength. This work presents a method to grow aligned high-quality 2D Te in a controllable manner. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
19980124
Volume :
15
Issue :
6
Database :
Complementary Index
Journal :
Nano Research
Publication Type :
Academic Journal
Accession number :
157262522
Full Text :
https://doi.org/10.1007/s12274-022-4188-7