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Cold plasma can alleviate cadmium stress by optimizing growth and yield of wheat (Triticum aestivum L.) through changes in physio-biochemical properties and fatty acid profile.
- Source :
- Environmental Science & Pollution Research; May2022, Vol. 29 Issue 24, p35897-35907, 11p
- Publication Year :
- 2022
-
Abstract
- Cold plasma (CP) application has increasing interest due to its environmental-friendly, high efficient, and low cost aspects to mitigate deletion effects of heavy metals on plants. A pot experiment was carried out to evaluate the CP application on yield, physiological, and fatty acid profile of wheat (Triticum aestivum L.) in a completely randomized design (CRD) with five replicates. Cadmium (Cd) was applied at four levels (0, 50, 100, and 150 μM), and CP were used on germinated seeds at three levels (0, 60, and 120 s) in a hydroponic system. The results showed CP alleviated the Cd accumulation in roots, shoots, and grains. The significant reduction of grain yield (GY) and thousand grain yield (TGY) was observed in plants exposed to 100 and 150 μM compared with the control plants; however, CP improved GY and TGY particularly at severe Cd stress. The minimum chlorophyll (Chl) and relative water content (RWC) were observed in plants exposed in 100 μM Cd and non-CP treatments. Proline increased by Cd stress but decreased with CP in most treatments. Unlike proline, methionine showed significant reduction under Cd stress. The fatty acid profile of wheat represented that severe Cd stress decreased monounsaturated fatty acid (MUFA) but increased polyunsaturated fatty acid (PUFA). Heat map (HM) showed that GY and methionine were the most sensitive traits under treatments of Cd and CP. Totally, we suggest the use of 120 s of CP to mitigate Cd stress on wheat plants. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09441344
- Volume :
- 29
- Issue :
- 24
- Database :
- Complementary Index
- Journal :
- Environmental Science & Pollution Research
- Publication Type :
- Academic Journal
- Accession number :
- 156759217
- Full Text :
- https://doi.org/10.1007/s11356-022-18630-3