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Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals.
- Source :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2022, Vol. 40 Issue 3, p1-7, 7p
- Publication Year :
- 2022
-
Abstract
- Good specimen quality is a key factor in achieving successful scanning transmission electron microscope analysis. Thin and damage-free specimens are prerequisites for obtaining atomic-resolution imaging. Topological insulator single crystals and thin films in the chalcogenide family such as Sb<subscript>2</subscript>Te<subscript>3</subscript> are sensitive to electron and ion beams. It is, therefore, challenging to prepare a lamella suitable for high-resolution imaging from these topological insulator materials using standard focused ion-beam instruments. We have developed a modified method to fabricate thin focused ion-beam (FIB) lamellae with minimal ion-beam damage and artifacts. The technique described in the current study enables the reliable preparation of high-quality transmission electron microscope (TEM) specimens necessary for studying ultra-thin surface regions. We have successfully demonstrated that the careful selection of FIB milling parameters at each stage minimizes the damage layer without the need for post-treatment. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07342101
- Volume :
- 40
- Issue :
- 3
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
- Publication Type :
- Academic Journal
- Accession number :
- 156736892
- Full Text :
- https://doi.org/10.1116/6.0001771