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Structure, morphology and I–V characteristics of thermally evaporated LaAlO3 nanostructured thin films.

Authors :
Sugumaran, S.
Divya, T. A.
Sivaraman, R. K.
Bellan, C. S.
Sekhar, K. C.
Jamlos, M. F.
Source :
Journal of Materials Science: Materials in Electronics; Apr2022, Vol. 33 Issue 12, p9085-9100, 16p
Publication Year :
2022

Abstract

Nanostructured perovskite LaAlO<subscript>3</subscript> thin films with thickness of 50 nm, 100 nm, and 150 nm were prepared using thermal evaporation technique. The Fourier transform infrared spectroscopy study reveals the presence of La–Al–O bond. X-ray diffraction pattern confirms the perovskite LaAlO<subscript>3</subscript> structure. Scanning electron microscope images show the uniform furry structured rods, mixed rods/cubes and flower structured morphology. The presence of elements like La, Al, and O was confirmed from the energy-dispersive X-ray spectroscopy. Current–voltage (I–V) characteristics of Al/LaAlO<subscript>3</subscript>/Al sandwich capacitor structure show the existence of Poole–Frenkel type conduction mechanism with low leakage current (0.75 × 10<superscript>–7</superscript> to 1.5 × 10<superscript>–7</superscript> A/cm<superscript>2</superscript>), low activation energy (2.59 to 0.21 eV) and decrease in potential barrier with an increase in the electric field. The acquired results indicated that the prepared LaAlO<subscript>3</subscript> nanothin film could be captivated with utilization as a dielectric layer in various electronic devices in the future. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09574522
Volume :
33
Issue :
12
Database :
Complementary Index
Journal :
Journal of Materials Science: Materials in Electronics
Publication Type :
Academic Journal
Accession number :
156297926
Full Text :
https://doi.org/10.1007/s10854-021-07139-z