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Structure, morphology and I–V characteristics of thermally evaporated LaAlO3 nanostructured thin films.
- Source :
- Journal of Materials Science: Materials in Electronics; Apr2022, Vol. 33 Issue 12, p9085-9100, 16p
- Publication Year :
- 2022
-
Abstract
- Nanostructured perovskite LaAlO<subscript>3</subscript> thin films with thickness of 50 nm, 100 nm, and 150 nm were prepared using thermal evaporation technique. The Fourier transform infrared spectroscopy study reveals the presence of La–Al–O bond. X-ray diffraction pattern confirms the perovskite LaAlO<subscript>3</subscript> structure. Scanning electron microscope images show the uniform furry structured rods, mixed rods/cubes and flower structured morphology. The presence of elements like La, Al, and O was confirmed from the energy-dispersive X-ray spectroscopy. Current–voltage (I–V) characteristics of Al/LaAlO<subscript>3</subscript>/Al sandwich capacitor structure show the existence of Poole–Frenkel type conduction mechanism with low leakage current (0.75 × 10<superscript>–7</superscript> to 1.5 × 10<superscript>–7</superscript> A/cm<superscript>2</superscript>), low activation energy (2.59 to 0.21 eV) and decrease in potential barrier with an increase in the electric field. The acquired results indicated that the prepared LaAlO<subscript>3</subscript> nanothin film could be captivated with utilization as a dielectric layer in various electronic devices in the future. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09574522
- Volume :
- 33
- Issue :
- 12
- Database :
- Complementary Index
- Journal :
- Journal of Materials Science: Materials in Electronics
- Publication Type :
- Academic Journal
- Accession number :
- 156297926
- Full Text :
- https://doi.org/10.1007/s10854-021-07139-z