Study on interfacial characteristics of constituent phases and mechanical properties of vanadium nitride films.

Authors :: Bian, Shunuo
Yu, Lihua
Xu, Junhua
Ju, Hongbo
Wang, Jie
Luo, Huang
Source :: Applied Physics A: Materials Science & Processing; Mar2022, Vol. 128 Issue 3, p1-6, 6p
Publication Year :: 2022
Abstract: A series of vanadium nitride films were deposited by the magnetron sputtering system under different nitrogen to argon ratios. Results exhibited that the phase composition of the VN(Vanadium Nitride) films varies as the ratio of nitrogen to argon gradually increased from 1:10 to 10:10 as follows: VN + V → VN + V<subscript>2</subscript>N + V → VN + V<subscript>2</subscript>N; A single fcc-VN phase vanadium nitride film cannot be prepared under our magnetron sputtering preparation conditions. Phase composition and the interfacial growth pattern of different phases have a noticeable influence on the hardness of films. When the ratio of nitrogen to argon was 7:10, vanadium nitride film which is composed of VN phase, V<subscript>2</subscript>N phase and V phase gained the maximum hardness value of 22.4 GPa and VN(111) and V<subscript>2</subscript>N(110), VN(111) and V(110) were in a coherent relationship at the interface. [ABSTRACT FROM AUTHOR]

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