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Engineering an oxygen-vacancy-mediated step-scheme charge carrier dynamic coupling WO3−X/ZnFe2O4 heterojunction for robust photo-Fenton-driven levofloxacin detoxification.

Authors :
Das, Kundan Kumar
Mansingh, Sriram
Sahoo, Dipti Prava
Mohanty, Ritik
Parida, Kulamani
Source :
New Journal of Chemistry; 3/28/2022, Vol. 46 Issue 12, p5785-5798, 14p
Publication Year :
2022

Abstract

Designing a heterojunction through oxygen vacancy (OV) has been considered as a well-accepted stratagem for enhanced photo-Fenton activity. Therefore, we have adopted a combination of hydrothermal and calcination methods to fabricate an abundant step-scheme photocatalyst by uniting ZnFe<subscript>2</subscript>O<subscript>4</subscript> with an oxygen-defect-oriented WO<subscript>3</subscript> semiconductor and verified their activities towards levofloxacin (LVX) degradation under solar-light illumination. The as-synthesized 15%WO<subscript>3−X</subscript>/ZnFe<subscript>2</subscript>O<subscript>4</subscript> binary hybrid displayed increased photo-Fenton activity for LVX degradation (k<subscript>app</subscript> value 4–7 times greater than that of pure semiconductors). The increased activity can be attributed to effective charge transmission occurring between the conduction band of defective WO<subscript>3−X</subscript> and the valence band of ZnFe<subscript>2</subscript>O<subscript>4</subscript> bridged through mediator-free OVs. The existence of OVs was well-supported with the assistance of Raman, XPS, and EPR characterization, whereas the proposed S-scheme charge transfer mechanism was proved by hydroxyl and super-oxide radical generation experiments. Furthermore, the photo-Fenton system constructed by H<subscript>2</subscript>O<subscript>2</subscript> and continuous Fe(III)/Fe(II) conversion resulted in high concentration of ˙OH radical that ultimately encouraged faster LVX degradation. Through the identification of reaction intermediates via LC-MS analysis, the LVX degradation pathways were speculated. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
11440546
Volume :
46
Issue :
12
Database :
Complementary Index
Journal :
New Journal of Chemistry
Publication Type :
Academic Journal
Accession number :
155869003
Full Text :
https://doi.org/10.1039/d2nj00067a