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Applications of the National Institute of Standards and Technology (NIST) database for the simulation of electron spectra for surface analysis for quantitative x-ray photoelectron spectroscopy of nanostructures.
- Source :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2021, Vol. 39 Issue 6, p1-13, 13p
- Publication Year :
- 2021
-
Abstract
- sessa (Simulation of Electron Spectra for Surface Analysis) is a software that was frequently used by the late Charles Fadley, since it provides a convenient means to simulate peak intensities as well as entire spectral regions for photoelectron spectroscopy. X-ray photoelectron spectra can be simulated for several types of nanostructures. sessa can also be utilized in more complex cases, e.g., if the nondipolar terms in the photoelectric ionization cross section need to be taken into account, a typical situation encountered in spectroscopy using synchrotron radiation. The software was initially released in 2005 as a National Institute of Standards and Technology Standard Reference Database. Here, we describe two new features that have recently been added to the newest version (sessa V2.2) of the software, i.e., simulation of surface excitations and an effective approach to account for the energy dependence of the interaction characteristics of emitted photoelectrons. Furthermore, we illustrate some functionalities of sessa by presenting several applications. These include overlayer measurements to determine the effective electron attenuation length, quantitative analysis of impurities in multilayer materials, analysis of ionic liquids, the influence of nondipolar effects for photon energies above a few keV, and analysis of nanoparticles by means of photoelectron spectroscopy. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07342101
- Volume :
- 39
- Issue :
- 6
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
- Publication Type :
- Academic Journal
- Accession number :
- 153795125
- Full Text :
- https://doi.org/10.1116/6.0001261