A Simple Process for the Fabrication of Thermoelectric Silicon and Manganese Silicide Phases by Thin Film Solid Phase Reaction (SPR) of Mn/Si (100).

MLA

Zirmi, Rachid, et al. “A Simple Process for the Fabrication of Thermoelectric Silicon and Manganese Silicide Phases by Thin Film Solid Phase Reaction (SPR) of Mn/Si (100).” Journal of Electronic Materials, vol. 50, no. 11, Nov. 2021, pp. 6196–205. EBSCOhost, https://doi.org/10.1007/s11664-021-09146-6.

APA

Zirmi, R., Zouak, B., Panciera, F., Record, M. C., & Achour, H. (2021). A Simple Process for the Fabrication of Thermoelectric Silicon and Manganese Silicide Phases by Thin Film Solid Phase Reaction (SPR) of Mn/Si (100). Journal of Electronic Materials, 50(11), 6196–6205. https://doi.org/10.1007/s11664-021-09146-6

Chicago

Zirmi, Rachid, Belkacem Zouak, Federico Panciera, Marie Christine Record, and Hakim Achour. 2021. “A Simple Process for the Fabrication of Thermoelectric Silicon and Manganese Silicide Phases by Thin Film Solid Phase Reaction (SPR) of Mn/Si (100).” Journal of Electronic Materials 50 (11): 6196–6205. doi:10.1007/s11664-021-09146-6.