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55.1: Invited Paper: FMM‐free OLED Manufacturing Enabled by Photolithographic Patterning Processes.

Authors :
Ke, Tung-Huei
Sandeheng, Calvin Mona
Alvarez, Gema Molina
Vandenplas, Erwin
Ciarnain, Rossa Mac
Malinowski, Pawel E.
Genoe, Jan
Heremans, Paul
Source :
SID Symposium Digest of Technical Papers; Aug2021 Supplement S1, Vol. 52, p655-658, 4p
Publication Year :
2021

Abstract

Resolution and brightness are the essential figure‐of‐merits for the microdisplay development needed for AR and VR applications. In this presentation, we show our technology development toward high‐resolution FMM‐free direct R‐G‐B OLED microdisplays. We show the schematic fabrication setup and integration route to fabricate red, green, and blue OLED pixels side‐by‐side by the OLED photolithographic patterning processes. We demonstrate a 1µm line and space feature with the photoresist and transfer the pattern to an OLED stack. With the high resolution of photoresist, high aperture ratio, and high‐resolution multicolor OLED pixel arrays are demonstrated. We also investigate the possible OLED degradations induced in the photolithography process. With the innovations in the process steps, OLED stacks, process environments, and photoresists, we demonstrate a breakthrough in the reliability of photolithography patterned OLED. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0097966X
Volume :
52
Database :
Complementary Index
Journal :
SID Symposium Digest of Technical Papers
Publication Type :
Academic Journal
Accession number :
152095987
Full Text :
https://doi.org/10.1002/sdtp.15238