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Vertical polarization-induced doping InN/InGaN heterojunction tunnel FET with hetero T-shaped gate.
- Source :
- Chinese Physics B; May2021, Vol. 30 Issue 5, p1-7, 7p
- Publication Year :
- 2021
-
Abstract
- A novel vertical InN/InGaN heterojunction tunnel FET with hetero T-shaped gate as well as polarization-doped source and drain region (InN-Hetero-TG-TFET) is proposed and investigated by Silvaco-Atlas simulations for the first time. Compared with the conventional physical doping TFET devices, the proposed device can realize the P-type source and N-type drain region by means of the polarization effect near the top InN/InGaN and bottom InGaN/InN heterojunctions respectively, which could provide an effective solution of random dopant fluctuation (RDF) and the related problems about the high thermal budget and expensive annealing techniques due to ion-implantation physical doping. Besides, due to the hetero T-shaped gate, the improvement of the on-state performance can be achieved in the proposed device. The simulations of the device proposed here in this work show I<subscript>ON</subscript> of 4.45 × 10<superscript>−5</superscript> A/μm, I<subscript>ON</subscript>/I<subscript>OFF</subscript> ratio of 10<superscript>13</superscript>, and SS<subscript>avg</subscript> of 7.5 mV/dec in InN-Hetero-TG-TFET, which are better than the counterparts of the device with a homo T-shaped gate (InN-Homo-TG-TFET) and our reported lateral polarization-induced InN-based TFET (PI-InN-TFET). These results can provide useful reference for further developing the TFETs without physical doping process in low power electronics applications. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 16741056
- Volume :
- 30
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Chinese Physics B
- Publication Type :
- Academic Journal
- Accession number :
- 151914333
- Full Text :
- https://doi.org/10.1088/1674-1056/abd73f