Back to Search Start Over

Colloidal Lithography for Photovoltaics: An Attractive Route for Light Management.

Authors :
Oliveira, Rui D.
Mouquinho, Ana
Centeno, Pedro
Alexandre, Miguel
Haque, Sirazul
Martins, Rodrigo
Fortunato, Elvira
Águas, Hugo
Mendes, Manuel J.
Source :
Nanomaterials (2079-4991); Jul2021, Vol. 11 Issue 7, p1665-1665, 1p
Publication Year :
2021

Abstract

The pursuit of ever-more efficient, reliable, and affordable solar cells has pushed the development of nano/micro-technological solutions capable of boosting photovoltaic (PV) performance without significantly increasing costs. One of the most relevant solutions is based on light management via photonic wavelength-sized structures, as these enable pronounced efficiency improvements by reducing reflection and by trapping the light inside the devices. Furthermore, optimized microstructured coatings allow self-cleaning functionality via effective water repulsion, which reduces the accumulation of dust and particles that cause shading. Nevertheless, when it comes to market deployment, nano/micro-patterning strategies can only find application in the PV industry if their integration does not require high additional costs or delays in high-throughput solar cell manufacturing. As such, colloidal lithography (CL) is considered the preferential structuring method for PV, as it is an inexpensive and highly scalable soft-patterning technique allowing nanoscopic precision over indefinitely large areas. Tuning specific parameters, such as the size of colloids, shape, monodispersity, and final arrangement, CL enables the production of various templates/masks for different purposes and applications. This review intends to compile several recent high-profile works on this subject and how they can influence the future of solar electricity. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20794991
Volume :
11
Issue :
7
Database :
Complementary Index
Journal :
Nanomaterials (2079-4991)
Publication Type :
Academic Journal
Accession number :
151589348
Full Text :
https://doi.org/10.3390/nano11071665