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A New Approach for the Control and Reduction of Warpage and Residual Stresses in Bonded Wafer.

Authors :
Farshchi Yazdi, Seyed Amir Fouad
Garavaglia, Matteo
Ghisi, Aldo
Corigliano, Alberto
Source :
Micromachines; Apr2021, Vol. 12 Issue 4, p361-361, 1p
Publication Year :
2021

Abstract

A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
2072666X
Volume :
12
Issue :
4
Database :
Complementary Index
Journal :
Micromachines
Publication Type :
Academic Journal
Accession number :
150894645
Full Text :
https://doi.org/10.3390/mi12040361