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A Global Shutter Wide Dynamic Range Soft X-Ray CMOS Image Sensor With Backside- Illuminated Pinned Photodiode, Two-Stage Lateral Overflow Integration Capacitor, and Voltage Domain Memory Bank.

Authors :
Shike, Hiroya
Kuroda, Rihito
Kobayashi, Ryota
Murata, Maasa
Fujihara, Yasuyuki
Suzuki, Manabu
Harada, Shoma
Shibaguchi, Taku
Kuriyama, Naoya
Hatsui, Takaki
Miyawaki, Jun
Harada, Tetsuo
Yamasaki, Yuichi
Watanabe, Takeo
Harada, Yoshihisa
Sugawa, Shigetoshi
Source :
IEEE Transactions on Electron Devices; Apr2021, Vol. 68 Issue 4, p2056-2063, 8p
Publication Year :
2021

Abstract

This article presents a prototype 22.4 μm pixel pitch global shutter (GS) wide dynamic range (WDR) soft X-ray CMOS image sensor (sxCMOS). Backside-illuminated (BSI) pinned photodiodes with a 45-μm thick Si substrate were introduced for low noise and high radiation hardness to high energy photons. Two-stage lateral overflow integration capacitor (LOFIC) and voltage domain memory bank with high-density Si trench capacitors were introduced for WDR and for GS. The developed sxCMOS achieved maximum 21.9 Me− full well capacity with a single exposure 129 dB dynamic range by GS operation. Over 70% quantum efficiency (QE) toward soft X-ray was successfully achieved. The developed prototype sxCMOS is a step forward toward a 4 M pixel detector system to be utilized in next-generation synchrotron radiation facilities and X-ray free-electron lasers. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
68
Issue :
4
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
150518116
Full Text :
https://doi.org/10.1109/TED.2021.3062576