Performance analysis for reliable nanoscaled FinFET logic circuits.

In the process of continuous miniaturization of devices, it is necessary to look for new devices which overcome the drawbacks of non-scalability and higher static power of metal oxide semiconductor field effect transistor (MOSFET). Fin-shaped field effect transistor (FinFET) is an important device which uses the concept of multi-gates and it is not only scalable but also dissipate lower power at lower technology nodes. This paper designs a low leakage input dependent (INDEP) approach for FinFET devices at 16 nm technology node. Numbers of logic gates are designed and simulated with the help of MOSFET and FinFET devices. Simulation results are compared by calculating the important parameters like leakage power, delay and power delay product (PDP). The designed low leakage INDEP approach is compared with the leakage control transistor (LECTOR) technique. Simulation results for different logic circuits show the large reduction in leakage power in case of FinFET logic gates as compared to MOSFET devices and more leakage saving in case of INDEP approach as compared to conventional as well as LECTOR technique. Reliability in terms of process, voltage and temperature (PVT) variations is checked by running the Monte-Carlo simulations for 1000 samples and observed that INDEP circuits are more reliable. [ABSTRACT FROM AUTHOR]