Modeling of Silicon Nanodots Nucleation and Growth Deposited by LPCVD on SiO2 : From Molecule/Surface Interactions to Reactor Scale Simulations.

Details

Language :

English

ISSN :

19464274

Volume :

959

Issue :

1

Database :

Complementary Index

Journal :

MRS Online Proceedings Library

Publication Type :

Conference

Accession number :

148675588

Full Text :

https://doi.org/10.1557/PROC-0959-M17-12