Structural and Elastic Properties of α‐(AlxGa1−x)2O3 Thin Films on (11.0) Al2O3 Substrates for the Entire Composition Range.

Structural properties of rhombohedral α‐(AlxGa1−x)2O3 thin films grown by two combinatorial pulsed laser deposition (PLD) techniques are investigated for the entire composition range. One α‐(AlxGa1−x)2O3 thin film is deposited on a 2 inch in diameter large a‐plane sapphire substrate using the continuous composition spread (CCS) PLD technique to fabricate a thin film with varying Al content ranging between x = 0.13 and x = 0.84. Laterally homogeneous α‐(AlxGa1−x)2O3 thin films exhibiting discrete Al contents are fabricated using radially segmented PLD targets on (11.0) Al2O3. Independent of the PLD technique, for x ≈ 0.55, a change from relaxed to pseudomorphic growth is observed as confirmed by the evolution of in‐ and out‐of‐plane lattice constants. The crystal structure is studied depending on the cation composition by X‐ray diffraction confirming the fabrication of epitaxial, corundum‐structured thin films. [ABSTRACT FROM AUTHOR]