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Physics-Based Diffusion Simulations for Preamorphized Ultrashallow Junctions.

Authors :
Cowern, N. E. B.
Colombeau, B.
Lampin, E.
Cristiano, F.
Claverie, A.
Lamrani, Y.
Duffy, R.
Venezia, V.
Heringa, A.
Wang, C. C.
Zechner, C.
Source :
MRS Online Proceedings Library; 2003, Vol. 765 Issue 1, p1-6, 6p
Publication Year :
2003

Details

Language :
English
ISSN :
19464274
Volume :
765
Issue :
1
Database :
Complementary Index
Journal :
MRS Online Proceedings Library
Publication Type :
Conference
Accession number :
148521613
Full Text :
https://doi.org/10.1557/PROC-765-D6.8