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The Oxide/Nitride Interface: a study for gate dielectrics and field passivation.

Authors :
Gila, B. P.
Luo, B.
Kim, J.
Mehandru, R.
LaRoche, J. R.
Onstine, A. H.
Lambers, E.
Siebein, K.
Abernathy, C. R.
Ren, F.
Pearton, S. J.
Source :
MRS Online Proceedings Library; 2003, Vol. 786 Issue 1, p1-12, 12p
Publication Year :
2003

Details

Language :
English
ISSN :
19464274
Volume :
786
Issue :
1
Database :
Complementary Index
Journal :
MRS Online Proceedings Library
Publication Type :
Conference
Accession number :
147646310
Full Text :
https://doi.org/10.1557/PROC-786-E8.5