A Model of Silicon Nanocrystal Nucleation and Growth on SiO2 by CVD.

Details

Language :

English

ISSN :

19464274

Volume :

831

Issue :

1

Database :

Complementary Index

Journal :

MRS Online Proceedings Library

Publication Type :

Conference

Accession number :

147498439

Full Text :

https://doi.org/10.1557/PROC-830-D5.7