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Band Alignment at the Al2O3/β-Ga2O3 Interface with CHF3 Treatment*.
- Source :
- Chinese Physics Letters; Jun2020, Vol. 37 Issue 7, p1-4, 4p
- Publication Year :
- 2020
-
Abstract
- The energy band alignment at the atomic layer deposited Al<subscript>2</subscript>O<subscript>3</subscript>/β-Ga<subscript>2</subscript>O<subscript>3</subscript> interface with CHF<subscript>3</subscript> treatment was characterized by x-ray photoelectron spectroscopy and secondary ion mass spectrometry (SIMS). With additional CHF<subscript>3</subscript> plasma treatment, the conduction band offset increases from 1.95±0.1 eV to 2.32±0.1 eV; and the valence band offset decreases from 0.21±0.1 eV to −0.16±0.1 eV. As a result, the energy band alignment changes from type I to type II. This energy band alignment transition could be attributed to the downshift of the core-level of Ga 3d, resulting from the Ga–F bond formation in the F-rich interfacial layer, which is confirmed by the SIMS results. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 0256307X
- Volume :
- 37
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Chinese Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 145522160
- Full Text :
- https://doi.org/10.1088/0256-307X/37/7/077302