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CF4/H2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material.

Authors :
Ferrah, Djawhar
Renault, Olivier
Marinov, Daniil
Arias-Zapata, Javier
Chevalier, Nicolas
Mariolle, Denis
Rouchon, Denis
Hanako Okuno
Bouchiat, Vincent
Cunge, Gilles
Source :
ACS Applied Nano Materials; 3/22/2019, Vol. 2 Issue 3, p1356-1366, 11p
Publication Year :
2019

Details

Language :
English
ISSN :
25740970
Volume :
2
Issue :
3
Database :
Complementary Index
Journal :
ACS Applied Nano Materials
Publication Type :
Academic Journal
Accession number :
144937169
Full Text :
https://doi.org/10.1021/acsanm.8b02249