Efficient Bayesian inversion for shape reconstruction of lithography masks.

MLA

Farchmin, Nando, et al. “Efficient Bayesian Inversion for Shape Reconstruction of Lithography Masks.” Journal of Micro/Nanolithography, MEMS & MOEMS, vol. 19, no. 2, Apr. 2020, p. 24001. EBSCOhost, https://doi.org/10.1117/1.JMM.19.2.024001.

APA

Farchmin, N., Hammerschmidt, M., Schneider, P.-I., Wurm, M., Bodermann, B., Bär, M., & Heidenreich, S. (2020). Efficient Bayesian inversion for shape reconstruction of lithography masks. Journal of Micro/Nanolithography, MEMS & MOEMS, 19(2), 24001. https://doi.org/10.1117/1.JMM.19.2.024001

Chicago

Farchmin, Nando, Martin Hammerschmidt, Philipp-Immanuel Schneider, Matthias Wurm, Bernd Bodermann, Markus Bär, and Sebastian Heidenreich. 2020. “Efficient Bayesian Inversion for Shape Reconstruction of Lithography Masks.” Journal of Micro/Nanolithography, MEMS & MOEMS 19 (2): 24001. doi:10.1117/1.JMM.19.2.024001.