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Numerical simulation of the positive streamer propagation and chemical reactions in SF6/N2 mixtures under non-uniform field.

Authors :
Luo, Bin
He, Hengxin
Cheng, Chen
Xia, Shengguo
Du, Weijie
Bian, Kai
Chen, Weijiang
Source :
IEEE Transactions on Dielectrics & Electrical Insulation; Jun2020, Vol. 27 Issue 3, p782-790, 9p
Publication Year :
2020

Abstract

SF 6 /N 2 mixtures is considered as a practical alternative proposal of SF 6 in GIS and GIL. Simulating particle transportations and chemical reactions during the positive streamer propagation in SF 6 /N 2 mixtures assists in the insulation performance optimization of SF 6 /N 2 mixtures. This paper presents a fluid dynamic model coupled with the chemical reaction system for the positive streamer propagation in SF 6 /N 2 mixtures. The Townsend coefficients of the 20%SF 6 /80%N 2 mixture derived from the proposed chemical reaction system are in accordance with the measurement results. Based on this model, the propagation of the positive streamer in a 1 mm needle-plate gap in the 20%SF 6 /80%N 2 mixture is simulated. Simulated results indicate that there exists a negative space charge region in the streamer channel. It can be attributed to the increasing attachment rates of SF 6 yielding SF 5 − and SF 6 −, and the reduction of the ionization rates of N 2 and SF 6 in the streamer channel. Besides, it is noted that the ionization activities of N 2 and SF 6 at the streamer head are equally important to support the continuous propagation of the positive streamer. The ionization of N 2 in the streamer channel serves as an important factor to supply electrons and avoid the accumulation of the negative space charge. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10709878
Volume :
27
Issue :
3
Database :
Complementary Index
Journal :
IEEE Transactions on Dielectrics & Electrical Insulation
Publication Type :
Academic Journal
Accession number :
143495484
Full Text :
https://doi.org/10.1109/TDEI.2019.008551