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Fabrication, structural and optical properties of a virtual GeSi template by Ge filling the porous Si prepared by EC etching.
- Source :
- Japanese Journal of Applied Physics; 5/1/2020, Vol. 59 Issue 5, p1-4, 4p
- Publication Year :
- 2020
-
Abstract
- In this paper, a virtual GeSi template has been successfully fabricated by Ge filling the porous silicon (PSi) prepared by electrochemical etching (EC etching). The microstructure quality measured with cross-sectional scanning electron microscopy and photoluminescence spectra reveal that the PSi structure is fully filled with uniformly distributed Ge. Furthermore, Raman and X-ray diffraction results also show that the template has a typical GeSi feature, which originates from Ge interdiffusion with PSi during the Ge deposition. This design and structure can be expected to be useful as a template for Ge-related materials growth and device fabrication. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00214922
- Volume :
- 59
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Japanese Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 143141807
- Full Text :
- https://doi.org/10.35848/1347-4065/ab86ff