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Semiconducting few-layer PdSe2 and Pd2Se3: native point defects and contacts with native metallic Pd17Se15.
- Source :
- Physical Chemistry Chemical Physics (PCCP); 4/14/2020, Vol. 22 Issue 14, p7365-7373, 9p
- Publication Year :
- 2020
-
Abstract
- PdSe<subscript>2</subscript> is a unique layered two-dimensional (2D) material with pentagonal structural motif and anisotropic properties. In addition, its strong interlayer interaction leads to new 2D form of the exfoliated monolayer, that is, Pd<subscript>2</subscript>Se<subscript>3</subscript>. Despite the increasing interest in these emerging 2D materials, the landscape of the native point defects, as a fundamental materials property, has not been revealed. In this work, we systematically investigate different types of defects in mono- and bi-layer PdSe<subscript>2</subscript> and monolayer Pd<subscript>2</subscript>Se<subscript>3</subscript>. In contrast to the common expectation, Se vacancy is not the readily formed defect. Instead, Se-excess defects, such as Se<subscript>Pd</subscript> antisite and Se interstitial, are more likely to form over a majority of the allowed range of the atomic chemical potentials. Se-deficiency defect, Pd interstitial, is able to form under the Se-poor condition in bilayer PdSe<subscript>2</subscript>. The defect-mediated interlayer fusion model in the formation of monolayer Pd<subscript>2</subscript>Se<subscript>3</subscript> from bilayer PdSe<subscript>2</subscript> is reformulated. These dominant defects are found to stay in the neutral charge state, partly explaining the ambipolar behavior of the PdSe<subscript>2</subscript> transistors. Finally, the stacked and lateral contacts between these few-layer semiconductors and the native Pd<subscript>17</subscript>Se<subscript>15</subscript> metal are also studied. All these interfaces show p-type contact properties. This work reveals the important materials properties of few-layer PdSe<subscript>2</subscript> and Pd<subscript>2</subscript>Se<subscript>3</subscript> for the better development of new functional devices. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 14639076
- Volume :
- 22
- Issue :
- 14
- Database :
- Complementary Index
- Journal :
- Physical Chemistry Chemical Physics (PCCP)
- Publication Type :
- Academic Journal
- Accession number :
- 142637277
- Full Text :
- https://doi.org/10.1039/c9cp06654c