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On the origin of open-circuit voltage losses in flexible n-i-p perovskite solar cells.

Authors :
Pisoni, Stefano
Stolterfoht, Martin
Löckinger, Johannes
Moser, Thierry
Jiang, Yan
Caprioglio, Pietro
Neher, Dieter
Buecheler, Stephan
Tiwari, Ayodhya N.
Source :
Science & Technology of Advanced Materials; Dec2019, Vol. 20 Issue 1, p786-795, 10p
Publication Year :
2019

Abstract

The possibility to manufacture perovskite solar cells (PSCs) at low temperatures paves the way to flexible and lightweight photovoltaic (PV) devices manufactured via high-throughput roll-to-roll processes. In order to achieve higher power conversion efficiencies, it is necessary to approach the radiative limit via suppression of non-radiative recombination losses. Herein, we performed a systematic voltage loss analysis for a typical low-temperature processed, flexible PSC in n-i-p configuration using vacuum deposited C<subscript>60</subscript> as electron transport layer (ETL) and two-step hybrid vacuum-solution deposition for CH<subscript>3</subscript>NH<subscript>3</subscript>PbI<subscript>3</subscript> perovskite absorber. We identified the ETL/absorber interface as a bottleneck in relation to non-radiative recombination losses, the quasi-Fermi level splitting (QFLS) decreases from ~1.23 eV for the bare absorber, just ~90 meV below the radiative limit, to ~1.10 eV when C<subscript>60</subscript> is used as ETL. To effectively mitigate these voltage losses, we investigated different interfacial modifications via vacuum deposited interlayers (BCP, B4PyMPM, 3TPYMB, and LiF). An improvement in QFLS of ~30–40 meV is observed after interlayer deposition and confirmed by comparable improvements in the open-circuit voltage after implementation of these interfacial modifications in flexible PSCs. Further investigations on absorber/hole transport layer (HTL) interface point out the detrimental role of dopants in Spiro-OMeTAD film (widely employed HTL in the community) as recombination centers upon oxidation and light exposure. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
14686996
Volume :
20
Issue :
1
Database :
Complementary Index
Journal :
Science & Technology of Advanced Materials
Publication Type :
Academic Journal
Accession number :
141719118
Full Text :
https://doi.org/10.1080/14686996.2019.1633952