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Phenyl siloxane hybrid xerogels: structure and porous texture.

Authors :
Moriones, P.
Echeverria, J. C.
Parra, J. B.
Garrido, J. J.
Source :
Adsorption; Feb2020, Vol. 26 Issue 2, p177-188, 12p
Publication Year :
2020

Abstract

The aim of this research is to investigate the effect of phenyltriethoxysilane (PhTEOS) and tetraethoxysilane (TEOS) molar ratios as silicon precursors on the structure and porous texture of xerogels. We have prepared phenyl-silane hybrid xerogels from mixtures of PhTEOS and TEOS at pH 10 and 333 K, using ethanol as a solvent. Characterization techniques include <superscript>29</superscript>Si NMR, FTIR, XRD, FE-SEM, HRTEM, TGA-DSC, helium density, and gas adsorption (N<subscript>2</subscript> at 77 K and CO<subscript>2</subscript> at 273 K). In order to assess the contribution of the quadrupolar moment of N<subscript>2</subscript> and CO<subscript>2</subscript> in the adsorption we obtained the adsorption–desorption isotherm of Ar at 87.3 K for the xerogel synthesized from 50% PhTEOS. The morphology of xerogels changed from aggregates of spherical particles for 20% PhTEOS to lamellae for samples obtained with PhTEOS percentages equal or larger that 60%. The incorporation of phenyl groups into the xerogel matrix caused an increase in the spacing bond between silicon atoms and led to an intramolecular reaction and the formation of lamellar domains. Increasing the PhTEOS molar ratio in the mixture of silicon precursors produced hybrid xerogels with lower specific surface area, pore volume and characteristic energy. The similarity between the isotherms of N<subscript>2</subscript> at 77 K and Ar at 87.3 K indicates that the main retention mechanism is physisorption and that the variation in the surface chemistry with the incorporation of phenyl groups doesn't inhibit the retention of N<subscript>2</subscript>. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09295607
Volume :
26
Issue :
2
Database :
Complementary Index
Journal :
Adsorption
Publication Type :
Academic Journal
Accession number :
141192802
Full Text :
https://doi.org/10.1007/s10450-019-00075-9