Dependence of the Kinetics of Radiation-Induced Defect Formation on the Energy Absorbed by Si and SiC when Exposed to Fast Charged Particles.

The kinetics of the formation of radiation-induced defects in silicon and silicon carbide as a function of the absorbed energy is analyzed. The dependence of the concentration of conduction electrons n-Si and n-SiC on the irradiation dose is studied experimentally under conditions of irradiation with electrons with an energy of 0.9 MeV and protons with an energy of 15 MeV. The advantages and disadvantages of using the integral flux (fluence) and absorbed energy as kinetic parameters are discussed. It is established in the performed studies that the visual representation of the kinetics of radiation-induced defect formation as a function of the fluence of irradiating particles is clearer for tabulating the requirements imposed to equipment stability under suitable conditions. To study the physical processes underlying the formation of radiation-induced defects in semiconductors, it is more convenient to use the dependences of the effects observed under radiation exposure as functions of the absorbed energy. [ABSTRACT FROM AUTHOR]