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Ion Beam Etch for the Patterning of Advanced Absorber Materials for EUV Masks.
- Source :
- Proceedings of SPIE; 8/29/2019, Vol. 11178, p1-6, 6p
- Publication Year :
- 2019
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 11178
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 137631474
- Full Text :
- https://doi.org/10.1117/12.2537992