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The polarization field in Al-rich AlGaN multiple quantum wells.

Authors :
Qiang Guo
Ronny Kirste
Seiji Mita
James Tweedie
Pramod Reddy
Shun Washiyama
M. Hayden Breckenridge
Ramón Collazo
Zlatko Sitar
Source :
Japanese Journal of Applied Physics; 6/1/2019, Vol. 58 Issue SC, p1-1, 1p
Publication Year :
2019

Abstract

This paper investigates the quantum confined Stark effect in AlGaN multiple quantum well structures with a high Al content grown on single-crystalline AlN substrates. The quantitative relationship between the quantum well structure parameters, photogenerated carrier density, built-in electric field and ground-level emission is discussed. It is found that the electric field strength increases from 0.5 MV cm<superscript>−1</superscript> to almost 3 MV cm<superscript>−1</superscript> when the Al content in the quantum well barriers is increased from 65% to 100%, which is consistent with the theory of spontaneous and piezoelectric polarization in III-nitrides. In addition, the built-in electric field increases significantly with increasing barrier thickness. Based on these results, the electric field in an Al<subscript>0.55</subscript>Ga<subscript>0.45</subscript>N single quantum well with AlN cladding is predicted to be around 5 MV cm<superscript>−1</superscript>. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00214922
Volume :
58
Issue :
SC
Database :
Complementary Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
137177016
Full Text :
https://doi.org/10.7567/1347-4065/ab07a9