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X-ray Diffraction Tomography Using Laboratory Sources for Studying Single Dislocations in a Low Absorbing Silicon Single Crystal.

Authors :
Zolotov, D. A.
Asadchikov, V. E.
Buzmakov, A. V.
D'yachkova, I. G.
Krivonosov, Yu. S.
Chukhovskii, F. N.
Suvorov, E. V.
Source :
Optoelectronics Instrumentation & Data Processing; Mar2019, Vol. 55 Issue 2, p126-132, 7p
Publication Year :
2019

Abstract

This paper is a continuation of previous studies on the development of X-ray topo-tomography using laboratory equipment. The results on the spatial location of a single polygonal dislocation half-loop in a silicon single crystal were obtained as a result of testing the sensitivity of the X-ray topo-tomo diffractometer. A comparison was made with high-resolution experimental data obtained at the European synchrotron radiation facility (ESRF). The experimental procedure, software, and hardware for 3D reconstruction of the investigated single defect — a polygonal dislocation half-loop — are described. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
87566990
Volume :
55
Issue :
2
Database :
Complementary Index
Journal :
Optoelectronics Instrumentation & Data Processing
Publication Type :
Academic Journal
Accession number :
137001164
Full Text :
https://doi.org/10.3103/S8756699019020031