Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD.

Here we report on the structural and tribo-mechanical characterization of epitaxial single-crystalline Ti₂AlC MAX phase thin films, grown by means of electron beam physical vapor deposition at relatively low temperature (700°C). The growth of phase pure Ti₂AlC at a relatively lower temperature when compared to other PVD methods was achieved utilizing a relatively low deposition rate and layer-by-layer deposition technique. The epitaxial growth is evidenced through the combination of XRD, HR-TEM and Raman spectroscopy measurements. The nanomechanical and micro-scale tribological properties of the Ti₂AlC thin films were studied by means of nanoindentation and nanoscratch tests. The growth temperature of phase pure single-crystalline Ti₂AlC MAX phase thin films was reduced to 700°C utilizing the low-rate layer-by-layer PVD technique. [ABSTRACT FROM AUTHOR]