Back to Search
Start Over
Impact of annealing on the current conduction and trap properties of CeO2/La2O3 metal-insulator-metal capacitors.
- Source :
- Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Mar2019, Vol. 37 Issue 2, pN.PAG-N.PAG, 5p
- Publication Year :
- 2019
-
Abstract
- This paper focuses on the impact of annealing on the current conduction and trap states of metal-insulator-metal capacitors with CeO<subscript>2</subscript>/La<subscript>2</subscript>O<subscript>3</subscript> dielectrics. Capacitance-frequency measurements identify two main trap levels (T<subscript>1</subscript> and T<subscript>2</subscript>), characterized by an activation energy of 0.2 and 0.3 eV, respectively, and by a time constant of 1 ms and 20 μs at room temperature. The current conduction is found to be ruled by a Poole-Frenkel effect and space charge limited current under positive and negative bias, respectively. Selective annealing of CeO<subscript>2</subscript> and La<subscript>2</subscript>O<subscript>3</subscript> layers clarifies the nature of the aforementioned traps. Although providing no change in the activation energy, an additional annealing of the CeO<subscript>2</subscript> and La<subscript>2</subscript>O<subscript>3</subscript> layer is found to significantly change the trap amplitude of T<subscript>1</subscript> and T<subscript>2</subscript>, respectively. The corresponding change of the current conduction in the region where trap assisted mechanisms play a major role is discussed. [ABSTRACT FROM AUTHOR]
- Subjects :
- POOLE-Frenkel effect
CAPACITORS
ACTIVATION energy
TRAPPING
ANNEALING of metals
Subjects
Details
- Language :
- English
- ISSN :
- 21662746
- Volume :
- 37
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
- Publication Type :
- Academic Journal
- Accession number :
- 135516794
- Full Text :
- https://doi.org/10.1116/1.5060712