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31.1: Invited Paper: Monochromatic Active Matrix Micro‐LED Micro‐Displays with >5,000 dpi Pixel Density Fabricated using Monolithic Hybrid Integration Process.

Authors :
Zhang, Lei
Ou, Fang
Chong, Wing Cheung
Chen, Yijing
Zhu, Yuankun
Li, Qiming
Source :
SID Symposium Digest of Technical Papers; Apr2018 Supplement S1, Vol. 49, p333-336, 4p
Publication Year :
2018

Abstract

Wafer‐scale epi‐transfer process has been developed for monolithic hybrid integration of Si‐based IC and micro‐LED arrays. Monochromatic red, green, and blue Active‐Matrix micro‐LED (AMmLED) micro‐displays with a resolution of 5000+ PPI were demonstrated for the first time by JBD using this wafer‐scale monolithic hybrid integration technology, which shows feasibility and advantages for low cost mass productions. The brightness of the demonstrated AMμLED micro‐display (green) well exceeds 5x105cd/m2, representing an improvement of over 500‐times compared to the existing self‐emissive micro‐displays. The ultra‐high pixel resolution, high brightness and contrast ratio, low power consumption, and small footprint makes AMμLED micro‐displays highly desirable for various wearable electronics and AR applications. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0097966X
Volume :
49
Database :
Complementary Index
Journal :
SID Symposium Digest of Technical Papers
Publication Type :
Academic Journal
Accession number :
133261214
Full Text :
https://doi.org/10.1002/sdtp.12718