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阵列基板栅极制程的 Cu 腐蚀研究.

Authors :
刘 丹
秦 刚
王任远
吕俊君
饶 毅
周 禹
王百强
李 路
蔡卫超
刘 涛
李晨雨
陈国良
Source :
Chinese Journal of Liquid Crystal & Displays; Sep2018, Vol. 39 Issue 9, p717-724, 8p
Publication Year :
2018

Abstract

<i>Copyright of Chinese Journal of Liquid Crystal & Displays is the property of Chinese Journal of Liquid Crystal & Displays and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)

Details

Language :
Chinese
ISSN :
10072780
Volume :
39
Issue :
9
Database :
Complementary Index
Journal :
Chinese Journal of Liquid Crystal & Displays
Publication Type :
Academic Journal
Accession number :
132650232
Full Text :
https://doi.org/10.3788/YJYXS20183309.0717