N-polar AlN buffer growth by metal–organic vapor phase epitaxy for transistor applications.

We present the electrical characterization of N-polar AlN layers grown by metal–organic vapor phase epitaxy and the demonstration of N-polar AlN-channel metal–semiconductor field-effect transistors (MESFETs). A high concentration of silicon is unintentionally incorporated during the high-temperature growth of N-polar AlN, causing a high buffer leakage current. The silicon concentration decreases from 2 × 10¹⁸ to 9 × 10¹⁵ cm⁻³ with decreasing growth temperature, reducing the buffer leakage current to 5.6 nA/mm at a 100 V bias. The N-polar AlN MESFET exhibits an off-state drain current of 0.27 nA/mm and a transistor on/off ratio of 4.6 × 10⁴ owing to the low leakage of AlN buffer layers. [ABSTRACT FROM AUTHOR]