Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

MLA

Stefano Dallorto, et al. “Atomic Layer Deposition for Spacer Defined Double Patterning of Sub-10 Nm Titanium Dioxide Features.” Nanotechnology, vol. 29, no. 40, Oct. 2018, p. 1. EBSCOhost, https://doi.org/10.1088/1361-6528/aad393.

APA

Stefano Dallorto, Daniel Staaks, Adam Schwartzberg, XiaoMin Yang, Kim Y Lee, Ivo W Rangelow, Stefano Cabrini, & Deirdre L Olynick. (2018). Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features. Nanotechnology, 29(40), 1. https://doi.org/10.1088/1361-6528/aad393

Chicago

Stefano Dallorto, Daniel Staaks, Adam Schwartzberg, XiaoMin Yang, Kim Y Lee, Ivo W Rangelow, Stefano Cabrini, and Deirdre L Olynick. 2018. “Atomic Layer Deposition for Spacer Defined Double Patterning of Sub-10 Nm Titanium Dioxide Features.” Nanotechnology 29 (40): 1. doi:10.1088/1361-6528/aad393.