A comparative study of selective dry and wet etching of germanium–tin (Ge1−xSnx) on germanium.

MLA

Yi Han, et al. “A Comparative Study of Selective Dry and Wet Etching of Germanium–tin (Ge1−xSnx) on Germanium.” Semiconductor Science & Technology, vol. 33, no. 8, Aug. 2018, p. 1. EBSCOhost, https://doi.org/10.1088/1361-6641/aace43.

APA

Yi Han, Yaoyao Li, Yuxin Song, Chaodan Chi, Zhenpu Zhang, Juanjuan Liu, Zhongyunsheng Zhu, & Shumin Wang. (2018). A comparative study of selective dry and wet etching of germanium–tin (Ge1−xSnx) on germanium. Semiconductor Science & Technology, 33(8), 1. https://doi.org/10.1088/1361-6641/aace43

Chicago

Yi Han, Yaoyao Li, Yuxin Song, Chaodan Chi, Zhenpu Zhang, Juanjuan Liu, Zhongyunsheng Zhu, and Shumin Wang. 2018. “A Comparative Study of Selective Dry and Wet Etching of Germanium–tin (Ge1−xSnx) on Germanium.” Semiconductor Science & Technology 33 (8): 1. doi:10.1088/1361-6641/aace43.