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Effects of H2 and N2 treatment for B2H6 dosing process on TiN surfaces during atomic layer deposition: an ab initio study.
- Source :
- RSC Advances; 2018, Vol. 8 Issue 38, p21164-21173, 10p
- Publication Year :
- 2018
Details
- Language :
- English
- ISSN :
- 20462069
- Volume :
- 8
- Issue :
- 38
- Database :
- Complementary Index
- Journal :
- RSC Advances
- Publication Type :
- Academic Journal
- Accession number :
- 130205874
- Full Text :
- https://doi.org/10.1039/c8ra02622j