Determination of refractive index and thickness of YbF3 thin films deposited at different bias voltages of APS ion source from spectrophotometric methods.

MLA

Yinhua Zhang, et al. “Determination of Refractive Index and Thickness of YbF3 Thin Films Deposited at Different Bias Voltages of APS Ion Source from Spectrophotometric Methods.” Advanced Optical Technologies, vol. 7, no. 1/2, Apr. 2018, pp. 33–37. EBSCOhost, https://doi.org/10.1515/aot-2017-0072.

APA

Yinhua Zhang, Shengming Xiong, Wei Huang, & Kepeng Zhang. (2018). Determination of refractive index and thickness of YbF3 thin films deposited at different bias voltages of APS ion source from spectrophotometric methods. Advanced Optical Technologies, 7(1/2), 33–37. https://doi.org/10.1515/aot-2017-0072

Chicago

Yinhua Zhang, Shengming Xiong, Wei Huang, and Kepeng Zhang. 2018. “Determination of Refractive Index and Thickness of YbF3 Thin Films Deposited at Different Bias Voltages of APS Ion Source from Spectrophotometric Methods.” Advanced Optical Technologies 7 (1/2): 33–37. doi:10.1515/aot-2017-0072.