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Nucleation mechanism and morphology evolution of MoS2 flakes grown by chemical vapor deposition.

Authors :
He-Ju Xu
Jian-Song Mi
Yun Li
Bin Zhang
Ri-Dong Cong
Guang-Sheng Fu
Wei Yu
Source :
Chinese Physics B; Dec2017, Vol. 26 Issue 12, p1-1, 1p
Publication Year :
2017

Abstract

We study the nucleation mechanism and morphology evolution of MoS<subscript>2</subscript> flakes grown by chemical vapor deposition (CVD) on SiO<subscript>2</subscript>/Si substrates with using S and MoO<subscript>3</subscript> powders. The MoS<subscript>2</subscript> flake is of monolayer with triangular nucleation, which might arise from the initial MoO<subscript>3−x</subscript> that is deposited on the substrate, and then bonded with S to form MoS2 flake. The ratio of Mo and S is higher than 1:2 at the beginning with Mo terminated triangular nucleation formed. After that, the morphology of MoS<subscript>2</subscript> flake evolves from triangle to similar hexagon, then to truncated triangle which is determined by the faster growth speed of Mo termination than that of S termination under the S rich environment. The nucleation density does not increase linearly with the increase of reactant concentration, which could be explained by the two-dimensional nucleation theory. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
16741056
Volume :
26
Issue :
12
Database :
Complementary Index
Journal :
Chinese Physics B
Publication Type :
Academic Journal
Accession number :
126584259
Full Text :
https://doi.org/10.1088/1674-1056/26/12/128102