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Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening.

Authors :
Steinberg, Christian
Al-Hussainawi, Nour
Papenheim, Marc
Mayer, Andre
Scheer, Hella-Christin
Matschuk, Maria
Pranov, Henrik
Source :
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-7, 7p
Publication Year :
2017

Abstract

To improve the optical performance of Fresnel lenses, a technique for preparing them with antireflective structures of the moth-eye type is developed. Masters featuring such hierarchical structures are prepared in SU-8, a negative tone photoresist, by two consecutive thermal imprint steps. The moth-eye structures imprinted first are vacuum ultraviolet-treated at 172 nm to provide a surface-near the cross-linked layer that remains stable during the second imprint of the 100 µm sized Fresnel structures. A successful combination of both structure types is possible at an imprint temperature as low as 45 °C. This can be understood on the basis of the typical exposure and the crosslinking behavior of a chemically amplified negative tone resist like SU-8. The masters prepared in this way will be subjected to extrusion coating, the process of choice for future large area preparation of such structures in a single step. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21662746
Volume :
35
Issue :
6
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
Publication Type :
Academic Journal
Accession number :
126537196
Full Text :
https://doi.org/10.1116/1.4991863