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Study on the band alignment of GaN/CH3NH3PbBr3 heterojunction by x-ray photoelectron spectroscopy.
- Source :
- Applied Physics Letters; 9/18/2017, Vol. 111 Issue 12, p122103-1-122103-4, 4p, 1 Diagram, 1 Chart, 3 Graphs
- Publication Year :
- 2017
-
Abstract
- A GaN/CH<subscript>3</subscript>NH<subscript>3</subscript>PbBr<subscript>3</subscript> heterojunction was fabricated by depositing a GaN thin layer on a CH<subscript>3</subscript>NH<subscript>3</subscript>PbBr<subscript>3</subscript> single crystal by plasma enhanced atomic layer deposition. The band alignment of the GaN/CH<subscript>3</subscript>NH<subscript>3</subscript>PbBr<subscript>3</subscript> heterojunction was studied by x-ray photoelectron spectroscopy. The valance band offset (VBO) is directly determined to be 0.13 ± 0.08 eV. The conduction band offset is deduced from the VBO and the band gaps, which turned out to be 1.39 ± 0.12 eV. Thus, the band alignment of the GaN/CH<subscript>3</subscript>NH<subscript>3</subscript>PbBr<subscript>3</subscript> heterojunction is determined to be type-I. These results show that GaN is a promising material for carrier confinement in halide perovskite based light emitting devices. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 111
- Issue :
- 12
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 125307873
- Full Text :
- https://doi.org/10.1063/1.4997229