Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering.

Authors :: Studenyak, I. P.
Kutsyk, M. M.
Bendak, A. V.
Izai, V. Yu.
Kúš, P.
Mikula, M.
Source :: Semiconductor Physics, Quantum Electronics & Optoelectronics; 2017, Vol. 20 Issue 2, p246-249, 4p
Publication Year :: 2017
Abstract: Cu<subscript>6</subscript>PS<subscript>5</subscript>I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, their chemical composition were determined using energydispersive X-ray spectroscopy. As-deposited thin films were irradiated with wideband radiation of Cu-anode X-ray tube at different exposition times. Optical transmission spectra of X-ray irradiated Cu<subscript>5.56</subscript>P<subscript>1.66</subscript>S<subscript>4.93</subscript>I<subscript>0.85</subscript> thin films were measured depending on irradiation time. The Urbach absorption edge and dispersion of refractive index for X-ray irradiated Cu<subscript>5.56</subscript>P<subscript>1.66</subscript>S<subscript>4.93</subscript>I<subscript>0.85</subscript> thin films were studied. It has been revealed the nonlinear decrease of energy pseudogap and nonlinear increase of refractive index with increase of X-ray irradiation time. [ABSTRACT FROM AUTHOR]

Subjects :: THIN films
MAGNETRON sputtering
REFRACTIVE index
LIGHT absorption
PHASE transitions

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