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pH dependence of synchrotron x-ray induced electroless nickel deposition.
- Source :
- Journal of Applied Physics; 2/1/2004, Vol. 95 Issue 3, p1166-1170, 5p, 2 Black and White Photographs, 2 Diagrams, 2 Graphs
- Publication Year :
- 2004
-
Abstract
- We investigated the room temperature electroless nickel deposition on glass, induced by synchrotron x ray. By irradiating electrolytes with intense x ray the onset time for Ni reduction disappears at high electrolyte pH (>6.0) in sharp contrast with conventional electroless deposition. The time for Ni reduction in irradiated solution also decreases with increase in electrolyte pH. Consequently higher reduction rates in alkaline solutions (pH>8.0) raise the Ni nucleation density during deposition, as illustrated by homogeneous and complete coverage of the substrate by nanoparticles within a short period of 1 min. The enhancement in reduction rate is attributed to high redox efficiency of hydrated electrons produced by x ray as well as their redox potential enhancements under higher electrolyte pH conditions. © 2004 American Institute of Physics. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 95
- Issue :
- 3
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 11999122
- Full Text :
- https://doi.org/10.1063/1.1637724