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pH dependence of synchrotron x-ray induced electroless nickel deposition.

Authors :
Borse, P. H.
Yi, J. M.
Je, J. H.
Tsai, W. L.
Hwu, Y.
Source :
Journal of Applied Physics; 2/1/2004, Vol. 95 Issue 3, p1166-1170, 5p, 2 Black and White Photographs, 2 Diagrams, 2 Graphs
Publication Year :
2004

Abstract

We investigated the room temperature electroless nickel deposition on glass, induced by synchrotron x ray. By irradiating electrolytes with intense x ray the onset time for Ni reduction disappears at high electrolyte pH (>6.0) in sharp contrast with conventional electroless deposition. The time for Ni reduction in irradiated solution also decreases with increase in electrolyte pH. Consequently higher reduction rates in alkaline solutions (pH>8.0) raise the Ni nucleation density during deposition, as illustrated by homogeneous and complete coverage of the substrate by nanoparticles within a short period of 1 min. The enhancement in reduction rate is attributed to high redox efficiency of hydrated electrons produced by x ray as well as their redox potential enhancements under higher electrolyte pH conditions. © 2004 American Institute of Physics. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
95
Issue :
3
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
11999122
Full Text :
https://doi.org/10.1063/1.1637724