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High-gain complementary metal-oxide-semiconductor inverter based on multi-layer WSe2 field effect transistors without doping.

Authors :
Won-Mook Kang
In-Tak Cho
Jeongkyun Roh
Changhee Lee
Jong-Ho Lee
Source :
Semiconductor Science & Technology; Oct2016, Vol. 31 Issue 10, p1-1, 1p
Publication Year :
2016

Abstract

A high-gain complementary metal-oxide-semiconductor (CMOS) logic inverter was implemented by fabricating p- and n-type field effect transistors (FETs) based on multi-layer WSe<subscript>2</subscript> on the same wafer. Au as a high work-function metal is contacted to WSe<subscript>2</subscript> for the source/drain of the p-type FET. The n-type FET has an Al electrode contacted to WSe<subscript>2</subscript> for the source/drain. Both FETs were designed to have similar on-current densities (>10<superscript>−7</superscript> A μm<superscript>−1</superscript>) and high on/off current ratios (>10<superscript>6</superscript>). The inverter shows excellent switching characteristics including relatively high voltage gains (>25) and high noise margins (>0.9) in the range of supply voltage from 2 V to 8 V. This work has a great significance in the realization of a CMOS logic gate based on WSe<subscript>2</subscript> without an additional doping scheme. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
02681242
Volume :
31
Issue :
10
Database :
Complementary Index
Journal :
Semiconductor Science & Technology
Publication Type :
Academic Journal
Accession number :
118245403
Full Text :
https://doi.org/10.1088/0268-1242/31/10/105001