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ChemInform Abstract: Improvement of Dielectric Strength of Trench Capacitors by Using Rapidly Grown SiO2 Films.

Authors :
ARAKAWA, T.
FUKUDA, H.
OKABE, Y.
IWABUCHI, T.
OHNO, S.
Source :
ChemInform; Jul1990, Vol. 21 Issue 31, pno-no, 2p
Publication Year :
1990

Details

Language :
English
ISSN :
09317597
Volume :
21
Issue :
31
Database :
Complementary Index
Journal :
ChemInform
Publication Type :
Academic Journal
Accession number :
115671225
Full Text :
https://doi.org/10.1002/chin.199031334